首页> 外国专利> Electrolytic copper foil, surface-treated electrodeposited copper foil obtained using the electrolytic copper foil, copper-clad laminate and printed wiring board using the surface-treated electrodeposited copper foil

Electrolytic copper foil, surface-treated electrodeposited copper foil obtained using the electrolytic copper foil, copper-clad laminate and printed wiring board using the surface-treated electrodeposited copper foil

机译:电解铜箔,使用该电解铜箔得到的表面处理的电沉积铜箔,覆铜层压板和使用该表面处理的电沉积铜箔的印刷线路板

摘要

PROBLEM TO BE SOLVED: To provide an electrolytic copper foil which has a lower profile and a flatter surface with less waviness than a low-profile electrolytic copper foil that has been conventionally supplied to a market.;SOLUTION: The electrolytic copper foil is obtained through electrolysis in the cupric electrolyte solution; has such a surface in a deposition side as to present a surface roughness (Rzjis) of less than 1.0 m, a glossiness [Gs(60)] of 400 or higher, and a ratio ([TD glossiness]/[MD glossiness]) of the TD glossiness when measured in a width direction to the MD glossiness when measured in a flow direction in an amount of 0.9 to 1.1; and has such a surface in a glossy side as to present the surface roughness (Rzjis) of less than 2.0 m and the glossiness [Gs(60)] of 70 or higher.;COPYRIGHT: (C)2007,JPO&INPIT
机译:要解决的问题:提供一种电解铜箔,该电解铜箔具有比常规市场上出售的低轮廓电解铜箔低的轮廓和平坦的表面,并且波纹度较小。在铜电解质溶液中电解;具有沉积侧的表面,以使其表面粗糙度(Rzjis)小于1.0 m,光泽度[Gs(60)]为400或更高,并且比率([TD光泽度] / [MD光泽度])在宽度方向上测量的TD光泽度与在流动方向上测量的MD光泽度的比值为0.9至1.1。且具有光面的表面,使其表面粗糙度(Rzjis)小于2.0 m,且光泽度[Gs(60)]为70或更高。;版权所有:(C)2007,JPO&INPIT

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号