Production method of the SiO vapor deposition material SiO vapor deposition material, and raw materials for Si powder

摘要

Is SiO deposition material characterized in that the hydrogen gas content is 50ppm or less, can when depositing SiO on the substrate, to suppress the occurrence of splash, SiO deposited film has excellent barrier properties and transparency can be formed. By the degassing of hydrogen gas content of the raw material for Si powder to make these with less than 10ppm, and a hydrogen gas content is manufactured with high efficiency and at low cost SiO vapor deposition material of 50ppm or less. Thus, the manufacturing method of the SiO of the present invention may be food, medical supplies and is widely used as a method for producing a deposition material of the packaging material having a barrier property with transparency of pharmaceuticals.