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The excitation light source which generates the excited light which excites the sample of the semiconductor

机译:产生激发光的激发光源,激发半导体样品

摘要

PROBLEM TO BE SOLVED: To easily evaluate the internal electric field intensity, film thickness, and band gap energy of an epitaxial wafer.;SOLUTION: At spectroscopic measurement on a semiconductor multi-layer film, exciting light is irradiated to a semiconductor multi-layer film sample, and light emission from the sample is passed through the spectroscope and detected. Then the spectroscope is swept, and the detected intensity of light emission is recorded as a function of photon energy. In addition, white light is made incident onto the spectroscope. Light emergent from the spectroscope is made incident onto the sample. With the sample irradiated with external modulated light, the spectroscope is swept. Reflected light from the sample is detected, and a detected reflectance spectrum is recorded as a function of photon energy.;COPYRIGHT: (C)2004,JPO&NCIPI
机译:解决的问题:为了容易地评估外延晶片的内部电场强度,膜厚度和带隙能量。;解决方案:在半导体多层膜上进行光谱测量时,激发光照射到半导体多层上薄膜样品,样品中的光通过分光镜进行检测。然后扫光光谱仪,并将检测到的光发射强度记录为光子能量的函数。另外,白光入射到分光镜上。从分光镜射出的光入射到样品上。用外部调制光照射样品后,扫光光谱仪。检测样品的反射光,并将检测到的反射光谱记录为光子能量的函数。;版权所有:(C)2004,JPO&NCIPI

著录项

  • 公开/公告号JP4031712B2

    专利类型

  • 公开/公告日2008-01-09

    原文格式PDF

  • 申请/专利权人 三菱電機株式会社;

    申请/专利号JP20030009515

  • 发明设计人 竹内 日出雄;山本 佳嗣;

    申请日2003-01-17

  • 分类号G01N21/27;G01B11/06;G01N21/00;G01N21/64;H01L21/66;

  • 国家 JP

  • 入库时间 2022-08-21 20:16:54

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