Eliminating printability of sub-resolution defects in imprint lithography

摘要

The present invention provides a method of forming a desired pattern in a layer positioned on a substrate with a mold, the method including, inter alia, contacting the layer with the mold forming a shape therein having a plurality of features extending in a first direction; and altering dimensions of the shape of the layer in a second direction, orthogonal to the first direction, to eliminate a subset of the plurality of features having a dimension less that a predetermined magnitude while obtaining the desired pattern in the layer.