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Method of manufacturing a semiconductor device including a slab layer with a periodic air hole structure and a linear defect region
Method of manufacturing a semiconductor device including a slab layer with a periodic air hole structure and a linear defect region
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机译:制造包括具有周期性气孔结构和线性缺陷区域的平板层的半导体器件的方法
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摘要
A semiconductor device has a two-dimensional slab photonic crystal structure in which a substrate supports a sheet-like slab layer including, sequentially stacked, a lower cladding layer, an active layer, and an upper cladding layer. A periodic refractive index profile structure, in surfaces of the stacked layers, introduces a linear defect region that serves as a waveguide. A p-type region and an n-type region in the slab layer define a pn junction surface at a predetermined angle with respect to the surfaces of the stacked layers in the slab layer.
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