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Method for removal of pattern resist over patterned metal having an underlying spacer layer
Method for removal of pattern resist over patterned metal having an underlying spacer layer
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机译:去除具有下面间隔层的图案化金属上的图案抗蚀剂的方法
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摘要
A method of removing the pattern resist that remains on a microchip wafer after etching a patterned layer that is supported by a spacer layer. After the etch, the wafer is cleaned with a develop clean process that removes polymer residues from the pattern resist surface. Next is an ash to remove the hardened pattern resist surface, followed by removal of the pattern resist.
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