LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD USING MULTIPLE EXPOSURES AND MULTIPLE EXPOSURE TYPES

摘要

LITHOGRAPHIC APPARATUS AND DEVICEMANUFACTURING METHOD USING MULTIPLE EXPOSURES AND MULTIPLE EXPOSURE TYPES ABSTRACTA lithographic apparatus and method in which a relatively high resolution exposure, for example of a repeating pattern, is trimmed using a relatively low resolution exposure. According, a compromise between provision of a high resolution pattern and flexibility in the pattern to be formed is provided.Figure 14b