MONOPARTICULATE-FILM ETCHING MASK AND PROCESS FOR PRODUCING THE SAME, PROCESS FOR PRODUCING FINE STRUCTURE WITH THE MONOPARTICULATE-FILM ETCHING MASK, AND FINE STRUCTURE OBTAINED BY THE PRODUCTION PROCESS

摘要

A monoparticulate-film etching mask in which the particles constituting the monoparticulate film are disposed in a two-dimensional closest packing arrangement with high accuracy. With the mask, a fine structure suitable for use as an antireflection object, a nanoimprint, or a master for injection mold is obtained. The monoparticulate-film etching mask is produced by a process which comprises: a dropping step in which a dispersion comprising a solvent and particles dispersed therein is dropped onto a liquid surface inside a water tank; a monoparticulate-film formation step in which the solvent is volatilized to thereby form a monoparticulate film from the particles; and a transfer step in which the monoparticulate film is transferred to a substrate. In this mask, the particles are disposed in a two-dimensional closest packing arrangement and the dislocation of the particles D (%), which is defined by D (%)=|B-A| x100/A, is 10% or lower. In the equation, A is the average particle diameter of the particles and B is the average pitch of the particles of the monoparticulate film.