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COMPUTER-IMPLEMENTED METHODS AND SYSTEMS FOR DETERMINING DIFFERENT PROCESS WINDOWS FOR A WAFER PRINTING PROCESS FOR DIFFERENT RETICLE DESIGNS
COMPUTER-IMPLEMENTED METHODS AND SYSTEMS FOR DETERMINING DIFFERENT PROCESS WINDOWS FOR A WAFER PRINTING PROCESS FOR DIFFERENT RETICLE DESIGNS
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机译:确定用于不同掩模版设计的晶圆印刷工艺的不同工艺窗口的计算机实现方法和系统
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摘要
Computer-implemented methods and systems for determining different process windows for a wafer printing process for different reticle designs are provided. One method includes generating simulated images illustrating how each of the different reticle designs will be printed on a wafer at different values of one or more parameters of the wafer printing process. The method also includes detecting defects in each of the different reticle designs using the simulated images. In addition, the method includes determining a process window for the wafer printing process for each of the different reticle designs based on results of the detecting step.
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