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Organometallic compounds for chemical vapour deposition and atomic layer deposition of thin films
Organometallic compounds for chemical vapour deposition and atomic layer deposition of thin films
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机译:用于薄膜化学气相沉积和原子层沉积的有机金属化合物
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摘要
Organometallic compounds containing a phosphoamidinate ligand are provided. Such compounds are particularly suitable for use as vapor deposition precursors. Also provided are methods of depositing thin films, such as by ALD and CVD, using such compounds.展开▼
机译:提供了含有磷酸ami酰胺配体的有机金属化合物。这样的化合物特别适合用作气相沉积前体。还提供了使用这种化合物沉积薄膜的方法,例如通过ALD和CVD。 <图像文件=“ IMGA0001.GIF” he =“ 41” id =“ ia01” imgContent =“ chem” imgFormat =“ GIF” wi =“ 81” /> Chemistry>
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