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A COMPOSITION OF ETCHING SOLUTION FOR METAL FILM USING IN MANUFACTURING PROCESS OF THIN FILM TRANSISTOR LIQUID CRYSTAL DISPLAY AND ETCHING METHOD USING THE SAME
A COMPOSITION OF ETCHING SOLUTION FOR METAL FILM USING IN MANUFACTURING PROCESS OF THIN FILM TRANSISTOR LIQUID CRYSTAL DISPLAY AND ETCHING METHOD USING THE SAME
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机译:用于制造薄膜晶体管液晶显示过程的金属膜蚀刻溶液的组成及使用该方法的蚀刻方法
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摘要
An etchant composition for a metal film used in the manufacturing process of a TFT-LCD device, and a method for etching a metal film by using the etchant composition are provided to control the etching velocity freely, to obtain a satisfactory taper profile angle of 30-60 degrees and to improve the alignment of pattern. An etchant composition comprises 1-40 wt% of a compound containing Fe^3+; 0.1-10.0 wt% of a fluorine compound; and 50-98.1 wt% of water, and contains no an acidic compound. Preferably the compound containing Fe^3+ is selected from the group consisting of FeCl3, Fe(NO3)3, Fe2(SO4)3, NH4Fe(SO4)2, Fe(ClO4)3, FePO4 and Fe(NH4)3(C2O4)3; and the fluorine compound is selected from the group consisting of NaF, NaHF2, NH4F, NH4HF2, NH4BF4, NH4F, HF, KF, KHF2, AlF3 and HBF4.
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