GETTERING MEMBER, METHOD OF FORMING THE GETTERING MEMBER AND METHOD OF PERFORMING IMMERSION LITHOGRAPHY PROCESS USING THE GETTERING MEMBER

摘要

A gettering member, a method for forming the same, and a method for performing an immersion lithography process by using the same are provided to remove residues of a photo resist layer in immersion lithography equipment and to uniformly maintain the surface temperature of a substrate chuck. A gettering member includes a monitor substrate(30) and a conditioning layer(33). The conditioning layer is disposed on the monitor substrate and is made of hydrogen carbide compound. The conditioning layer has hexamethyldisilazane(HMDS). The conditioning layer has fluoride polymer material. The fluoride polymer material is one selected from the group consisting of a perfluoro acetate(PFA), hexafluoro acohol(HFA), and poly tetra fluoro ethylene(PTFE). The conditioning layer has non-fluoride polymer material. The non-fluoride polymer material is one selected from the group consisting of acrylate, meta-acrylate, poly norbornene, polystyrene, polystyrene, polyethylene, polycyclo-olefine, poly cycloOlefine-co-maleic(COMA), poly methyl methacrylate(PMMA), poly vinyl ether-co-maleic anhydride(VEMA).