首页> 外国专利> Memory cell e.g. non-volatile two-bit-Trapping layer-memory cell, operating method for e.g. memory card, involves applying voltage between gate electrode and substrate section such that charge carrier is injected into memory element

Memory cell e.g. non-volatile two-bit-Trapping layer-memory cell, operating method for e.g. memory card, involves applying voltage between gate electrode and substrate section such that charge carrier is injected into memory element

机译:存储单元非易失性两位陷阱层存储器单元,例如存储卡,涉及在栅电极和基板部分之间施加电压,以便将电荷载流子注入到存储元件中

摘要

The method involves applying a voltage to p-n junctions (114, 124) among a source region (112), a drain region (122) and a substrate section (130) such that an avalanche breakdown takes place at the respective p-n junction. Another voltage is applied between a gate electrode (170) and the substrate section such that a charge carrier (132) produced by the avalanche breakdown and injected into the substrate section is injected into a memory element that is arranged between the substrate section and the gate electrode. Independent claims are also included for the following: (1) a method for programming a memory cell (2) a method for deleting a memory cell (3) a semiconductor component with memory cells (4) an electronic system comprising the semiconductor component.
机译:该方法包括向源极区(112),漏极区(122)和衬底部分(130)之间的p-n结(114、124)施加电压,从而在相应的p-n结处发生雪崩击穿。在栅电极(170)和衬底部分之间施加另一电压,使得通过雪崩击穿产生并注入到衬底部分中的电荷载体(132)被注入到布置在衬底部分和栅极之间的存储元件中。电极。还包括以下独立权利要求:(1)一种用于对存储单元进行编程的方法(2),一种用于删除具有存储单元的存储单元(3)半导体组件的方法(4)包括该半导体组件的电子系统。

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