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Defect e.g. turbidity, testing device for use during manufacturing of semiconductor device, has photo detector detecting light scattered from test target surface, where surface is formed in non-structured area
Defect e.g. turbidity, testing device for use during manufacturing of semiconductor device, has photo detector detecting light scattered from test target surface, where surface is formed in non-structured area
The device has a light source lighting a test target surface with a test light, where the surface has a pellicle (P1), a structured area (Sx), in which a structure is formed, and a non-structured area (Sy), in which no structure is formed. The pellicle suspends or supports a thin layer (P2) to prevent adhesion of external materials on the structured area provided in the non-structured area. A photo detector detects the light that is broken, diffracted, deflected and/or scattered from the surface when a light scanning device scans the light. The surface is formed in the non-structured area.
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