首页> 外国专利> Defect e.g. turbidity, testing device for use during manufacturing of semiconductor device, has photo detector detecting light scattered from test target surface, where surface is formed in non-structured area

Defect e.g. turbidity, testing device for use during manufacturing of semiconductor device, has photo detector detecting light scattered from test target surface, where surface is formed in non-structured area

机译:缺陷例如浊度,用于半导体器件制造的测试装置,具有光电探测器,用于检测从测试目标表面散射的光,该表面形成在非结构化区域中

摘要

The device has a light source lighting a test target surface with a test light, where the surface has a pellicle (P1), a structured area (Sx), in which a structure is formed, and a non-structured area (Sy), in which no structure is formed. The pellicle suspends or supports a thin layer (P2) to prevent adhesion of external materials on the structured area provided in the non-structured area. A photo detector detects the light that is broken, diffracted, deflected and/or scattered from the surface when a light scanning device scans the light. The surface is formed in the non-structured area.
机译:该装置具有用测试光照亮测试目标表面的光源,其中该表面具有防护膜(P1),形成结构的结构化区域(Sx)和非结构化区域(Sy),其中没有形成结构。防护膜悬吊或支撑薄层(P2),以防止外部材料粘附在非结构化区域中提供的结构化区域上。当光扫描装置扫描光时,光电检测器检测从表面破碎,衍射,偏转和/或散射的光。该表面形成在非结构化区域中。

著录项

  • 公开/公告号DE102007062020A1

    专利类型

  • 公开/公告日2008-07-03

    原文格式PDF

  • 申请/专利权人 HORIBA LTD.;

    申请/专利号DE20071062020

  • 发明设计人 IKEDA TERUHIKO;KANZAKI TOYOKI;OHKA TATSUO;

    申请日2007-12-21

  • 分类号G01N21/956;G06K9/52;

  • 国家 DE

  • 入库时间 2022-08-21 19:49:09

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