首页> 外文会议>International Conference on Modeling and Analysis of Semiconductor Manufacturing (MASM 2000), May 10-12, 2000, Tempe, Arizona >STATISTICAL OUTLIER TESTS FOR DETECTING LATENT PHYSICAL DEFECTS IN SEMICONDUCTOR DEVICES AT ELECTRICAL PROBE
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STATISTICAL OUTLIER TESTS FOR DETECTING LATENT PHYSICAL DEFECTS IN SEMICONDUCTOR DEVICES AT ELECTRICAL PROBE

机译:用于在电探针上检测半导体设备中潜在物理缺陷的统计外在测试

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摘要

In Semiconductor manufacturing operations, wafers containing from a few hundred to many thousand devices are created in iterative cycles of material deposition, patterning, and selective removal. Before the wafers leave the factory, each individual device on the wafer is electrically tested to verify its functionality in a process know as electrical probe, bin probe, or simply probe. In this process, a vector of electrical measurements on each part is taken and compared to the specification limits for the device. Parts with measurements that fall outside the limits are marked to be discarded later when the wafer is sawn apart. The specification limits for devices are carefully calculated to ensure the best possible containment of devices with physical defects or variation outside the designed process window. In some cases, however, latent physical defects in a device do not have a large enough effect on the measured parameters to clearly distinguish that device from the population of normally functioning devices. In these cases, a more complex approach to identifying latent defects is required to preserve the quality of outgoing product. In this paper, a statistical outlier test based on regression models is employed to detect latent physical defects. Although these defects may have as little as a 3% electrical effect on the primary device outputs, the outlier test is able to achieve over 99% effectiveness against escapes with a false detection rate of less than 14%. Implementation of this outlier test at probe was the enabling factor that allowed this device line to achieve outgoing defectivity levels <100 PPM.
机译:在半导体制造操作中,包含数百至数千个器件的晶圆是在材料沉积,图案形成和选择性去除的迭代循环中创建的。在晶圆出厂之前,会对晶圆上的每个单独设备进行电测试,以通过称为电探针,仓探针或简单探针的过程验证其功能。在此过程中,将获取每个部分的电气测量矢量,并将其与设备的规格限制进行比较。测量结果超出限制的零件将被标记,以便在锯切晶圆时将其丢弃。器件的规格限制是经过仔细计算的,以确保在设计过程窗口之外最好地容纳具有物理缺陷或变化的器件。但是,在某些情况下,设备中潜在的物理缺陷对测量的参数影响不大,无法清楚地区分正常运行的设备。在这些情况下,需要使用更复杂的方法来识别潜在缺陷,以保持出厂产品的质量。在本文中,基于回归模型的统计异常值检验用于检测潜在的物理缺陷。尽管这些缺陷可能对主要设备的输出产生仅3%的电影响,但异常测试能够以超过14%的错误检测率实现超过99%的防逃逸效果。在探针处执行此异常测试是使该设备系列达到低于100 PPM的传出缺陷水平的推动因素。

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