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PROCEDURE AND PREPARATION FOR THE TREATMENT OF A WORK PROJECT

机译:处理工程项目的程序和准备

摘要

In a system for cleaning a workpiece or wafer, a boundary layer of heated liquid is formed on the workpiece surface. Ozone is provided around the workpiece. The ozone diffuses through the boundary layer and chemically reacts with contaminants on the workpiece surface. A jet of high velocity heated liquid is directed against the workpiece, to physically dislodge or remove a contaminant from the workpiece. The jet penetrates through the boundary layer at the point of impact. The boundary layer otherwise remains largely undisturbed. Preferably, the liquid includes water, and may also include a chemical. Steam may also be jetted onto the workpiece, with the steam also physically removing contaminants, and also heating the workpiece to speed up chemical cleaning. The workpiece and the jet of liquid are moved relative to each other, so that substantially all areas of the workpiece surface facing the jet are exposed at least momentarily to the jet. Sonic or electromagnetic energy may also be introduced to the workpiece.
机译:在用于清洁工件或晶片的系统中,加热液体的边界层形成在工件表面上。工件周围有臭氧。臭氧通过边界层扩散,并与工件表面的污染物发生化学反应。高速加热的液体射流对准工件,以物理方式从工件上清除或去除污染物。射流在冲击点穿透边界层。否则边界层在很大程度上保持不受干扰。优选地,液体包括水,并且还可以包括化学物质。也可以将蒸汽喷射到工件上,同时蒸汽还可以物理去除污染物,并加热工件以加快化学清洗的速度。工件和液体射流相对于彼此运动,使得工件表面的面对射流的基本上所有区域至少瞬时地暴露于射流。声能或电磁能也可以引入到工件中。

著录项

  • 公开/公告号DE60225817D1

    专利类型

  • 公开/公告日2008-05-08

    原文格式PDF

  • 申请/专利权人 SEMITOOL INC.;

    申请/专利号DE20026025817T

  • 申请日2002-07-23

  • 分类号H01L21/302;H01L21/304;B08B3;B08B3/02;B08B3/04;B08B3/08;B08B6;B08B7;H01L21;H01L21/02;H01L21/306;H01L21/3065;H01L23/495;H05K3/34;

  • 国家 DE

  • 入库时间 2022-08-21 19:47:50

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