PHOTOSENSITIVE RESIN COMPOSITION AND NEW ACID RADICAL-CONTAINING VINYL ESTER RESIN

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in flexibility of a cured film, excellent also in tackiness and suitable for use in an alkali developable resist ink, and a vinyl ester resin imparting such properties to a photosensitive resin composition.;SOLUTION: The photosensitive resin composition contains an acid radical-containing vinyl ester resin (A) and a photopolymerization initiator (B) as essential components, wherein the acid radical-containing vinyl ester resin (A) has a structure obtained by reacting a polyfunctional epoxy resin (a1) having a phenoxy group or a naphthoxy group, a 3-15C alkylene group and a urethane bond within a molecular structure with a monocarboxylic acid (a2) containing a radical polymerizable unsaturated double bond and a polybasic acid anhydride (a3).;COPYRIGHT: (C)2009,JPO&INPIT