METHOD OF REPAIRING DAMAGED LOW-DIELECTRIC CONSTANT SILICA-BASED FILM AND LOW-DIELECTRIC-CONSTANT SILICA-BASED FILM RESTORED BY THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a method of repairing a low-dielectric-constant silica-based film which is given a chemical damage by a cleaning liquid used for the purpose of removing residue such as a silica-based denatured substance produced during etching of a low-dielectric-constant silica-based film or a resist decomposed substance produced during ashing, or removing residue such as polishing waste produced during CMP processing.;SOLUTION: The method of repairing a low-dielectric-constant silica-based film is used to store in a container a substrate or a device which has a chemically damaged low-dielectric-constant silica-based film, introduce overheated steam into the container and heat the low-dielectric-constant silica-based film, thereby, the damaged low-dielectric-constant silica-based film is repaired.;COPYRIGHT: (C)2009,JPO&INPIT