首页> 外国专利> MIXTURE OF ORGANIC RUTHENIUM COMPLEXES, AND METHOD FOR PRODUCING THIN FILM COMPRISING METALLIC RUTHENIUM USING THE SAME

MIXTURE OF ORGANIC RUTHENIUM COMPLEXES, AND METHOD FOR PRODUCING THIN FILM COMPRISING METALLIC RUTHENIUM USING THE SAME

机译:有机钌配合物的混合物,以及使用该化合物制备包含金属钌的薄膜的方法

摘要

PROBLEM TO BE SOLVED: To provide a mixture of organic ruthenium complexes for use in producing a thin film that includes metallic ruthenium and is not contaminated with ruthenium oxide, by a chemical vapor deposition method, and a method for producing a thin film comprising metallic ruthenium using the same.;SOLUTION: The organic ruthenium complexes each comprising a β-diketonate and an unsaturated hydrocarbon compound having at least two double bonds as ligands are represented by formula (1). The mixture of the organic ruthenium complexes is comprised of two or more species of the organic ruthenium complexes represented by formula (1) each having mutually different L. In the formula, X and Y each represents a straight chain or branched 1-6C alkyl group, Z represents a hydrogen atom or a 1-4C alkyl group and L represents an unsaturated hydrocarbon compound having at least two double bonds.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种有机钌配合物的混合物,该混合物用于通过化学气相沉积法生产包含金属钌且未被氧化钌污染的薄膜,以及一种用于生产包含金属钌的薄膜的方法溶液:分别包含β-二酮酸酯和具有至少两个双键作为配体的不饱和烃化合物的有机钌配合物由式(1)表示。有机钌配合物的混合物由两种或多种由式(1)表示的有机钌配合物组成,每种具有互不相同的L。在该式中,X和Y分别表示直链或支链的1-6C烷基。 ,Z表示氢原子或1-4C烷基,L表示具有至少两个双键的不饱和烃化合物。版权所有:(C)2009,日本特许厅&INPIT

著录项

  • 公开/公告号JP2009137862A

    专利类型

  • 公开/公告日2009-06-25

    原文格式PDF

  • 申请/专利权人 UBE IND LTD;

    申请/专利号JP20070314478

  • 申请日2007-12-05

  • 分类号C07C49/92;C07F15/00;C07C45/77;C07F17/02;C23C16/18;

  • 国家 JP

  • 入库时间 2022-08-21 19:44:41

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