EVAPORATION SOURCE FOR ARC ION PLATING DEVICE AND ARC ION PLATING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an evaporation source for an arc ion plating device, wherein the utilization efficiency of a cathode is drastically enhanced and a thin film having high surface smoothness and small residual stress is formed.;SOLUTION: The evaporation source 1 for the arc ion plating device is provided with a magnetic field forming means 5 having a ring-shaped magnet 3 provided around the outer periphery of the cathode 2 and also having a solenoid coil 4 provided on the rear surface of the cathode 2. The magnetic field forming means 5 is constructed so that the direction of the polarity of the ring-shaped magnet 3 is opposite to that of the solenoid coil 4, and forms a magnetic field in which the minimum value of the magnetic flux density on an optional line extending from the center toward the peripheral edge of an evaporation surface for evaporating a substance forming the cathode 2 is ≥45 Gauss and the average value of the magnetic flux densities is ≥80 Gauss.;COPYRIGHT: (C)2009,JPO&INPIT