EVAPORATION SOURCE FOR ARC ION PLATING DEVICE AND ARC ION PLATING DEVICE

摘要

An evaporation source for an arc ion plating device, in which the utilization efficiency of the cathode is drastically enhanced and which forms on a target object a thin film having high surface smoothness and small residual stress. An evaporation source (1) for an arc ion plating device has magnetic field forming means (5) having a ring-shaped magnet (3) provided around the outer periphery of the cathode (2) and also having a solenoid coil (4) provided to the rear surface of the cathode (2). The magnetic field forming means (5) is adapted such that the direction of the polarity of the ring-shaped magnet (3) is opposite to that of the solenoid coil (4), and the magnetic field forming means (5) forms a magnetic field in which the minimum value of the magnetic flux densities on any line extending from the center toward the peripheral edge of an evaporation surface for evaporating a substance forming the cathode (2) is 45 Gauss or above and the average value of the magnetic flux densities is 80 Gauss or above.