MANUFACTURING METHOD OF THIN-FILM TYPE SEMICONDUCTOR SENSOR, AND THIN-FILM TYPE SEMICONDUCTOR SENSOR

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of a thin-film type semiconductor sensor capable of manufacturing the thin-film type semiconductor sensor having a membrane having improved mechanical strength, and the thin-film type semiconductor sensor.;SOLUTION: This method has a stopper film formation process for forming a thermal oxidation film 30 on the upper surface of a semiconductor substrate 10 prepared in a preparation process; the first etching process for forming a recessed part 30b by etching the semiconductor substrate 10 from the under surface 11 side by using an etching mask 20 formed in an etching mask formation process; and the second etching process for etching the semiconductor substrate 10 and the thermal oxidation film 30 by using etching liquid wherein the etching rate ratio between the semiconductor substrate 10 and the thermal oxidation film 30 is set at 2:1 and an etching mask 20, and thereby forming the end T of a flat surface 30c on the recessed part 30b side on the thermal oxidation film 30 to have a tapered shape in the sideward cross-sectional view tilted at a fixed gradient toward the under surface 11 side of the semiconductor substrate 10, to thereby acquire the membrane 30a from the thermal oxidation film 30.;COPYRIGHT: (C)2009,JPO&INPIT