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Processing the fluorite production manner of fluorite make micro processing ones, the fluorite make optical component,

机译:萤石加工萤石的生产方式为微处理方式,萤石为光学部件,

摘要

PPROBLEM TO BE SOLVED: To provide a method to manufacture a microfabricated object by fabricating the surface of a fluorite by chemical etching using ICP or RIE dry etching. PSOLUTION: Nickel layers 4 are formed by electroforming using a chromium film layer 2 being exposed by the patterning of resists 3 as an electrode (c). Then, the resists 3 are dissolved and eliminated using the nickel layers 4 as protective layers, the exposed chromium film layer 2 is eliminated by dry etching to expose the surface of a substrate 1 (d). Then, etching is conducted for the substrate 1 by dry etching of a chemical etching mode by chlorine-based gas using the nickel layers 4 as protective layers (e). When materials having deliquescence property are formed on the surface of the substrate 1, the materials are washed and eliminated by water or other methods. Then, the nickel layers 4 are dissolved and residual chromium films are dissolved employing other dissolving liquid and the objective fluorite substrate 1 on which a prescribed pattern is formed on the surface is completed (f). PCOPYRIGHT: (C)2005,JPO&NCIPI
机译:<要解决的问题:提供一种通过使用ICP或RIE干法刻蚀通过化学刻蚀来制造萤石的表面的制造微细物体的方法。

解决方案:通过使用通过抗蚀剂3的构图曝光的铬膜层2作为电极(c),通过电铸形成镍层4。然后,使用镍层4作为保护层溶解并去除抗蚀剂3,通过干蚀刻去除暴露的铬膜层2以暴露衬底1的表面(d)。然后,使用镍层4作为保护层(e),通过基于氯的气体的化学蚀刻方式的干蚀刻,对基板1进行蚀刻。当在基板1的表面上形成具有潮解性的材料时,通过水或其他方法清洗并去除该材料。然后,溶解镍层4,并使用其他溶解液溶解残留的铬膜,从而完成了在表面上形成有规定图案的目标萤石基板1(f)。

版权:(C)2005,JPO&NCIPI

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