HIGH-PURITY SHAPE-MEMORY ALLOY TARGET AND HIGH-PURITY SHAPE-MEMORY ALLOY THIN-FILM

摘要

PROBLEM TO BE SOLVED: To provide a shape-memory alloy that achieves dramatic improvement in etching characteristics of a shape-memory alloy, a shape-memory alloy target, and a shape-memory alloy thin-film.;SOLUTION: There are provided a high-purity shape-memory alloy, a high-purity shape-memory alloy target, and a high-purity shape-memory alloy thin-film, respectively, in which impurity components excluding constituent elements and gas components are ≤1,000 wt.ppm. In an Ni-Ti based shape-memory alloy and an Ni-Ti based shape-memory alloy target, an Al content and an Sn content are respectively ≤100 wt.ppm. In a Cu-Al based shape-memory alloy and a Cu-Al based shape-memory alloy target, an Ag content, an S content, and a Cl content are respectively ≤50 wt.ppm. In an Fe-Mn based shape-memory alloy and an Fe-Mn based shape-memory alloy target, an Al content and a Cr content are respectively ≤100 wt.ppm.;COPYRIGHT: (C)2009,JPO&INPIT