Printing of up to K1 = 0.03 less than that does not use the OPC process previous: SLM lithography

摘要

In the present application, also by two-dimensional analysis of the optical proximity effect interactions, the devices and methods disclosed previously, is extended by the for rapid calculation of the adjustment, creating a kernel computationally efficient. Calculations can be performed in real time, thus, it can then be substantial savings in the computational requirements and file size, to reduce the use of the OPC assist features.