SLM LITHOGRAPHY: PRINTING TO BELOW K1=.30 WITHOUT PREVIOUS OPC PROCESSING

摘要

Previously disclosed methods and devices are extended in this application by two-dimensional analysis of optical proximity interactions and by fashioning a computationally efficient kernel for rapid calculation of adjustments to be made. The computations can be made in realtime, whereby the use of OPC assist features can be reduced, with substantial savings in file size and computational requirements. ® KIPO & WIPO 2009