SUBSTRATE CARRYING ROBOT HAVING DUST-TIGHT MECHANISM, AND SEMICONDUCTOR MANUFACTURING APPARATUS HAVING THE ROBOT

摘要

PROBLEM TO BE SOLVED: To provide a dust-tight mechanism which prevents the generation of dust from the mechanisms, such as a linear slider positioned inside a linear motion type arm, and can be used even in a substrate carrying robot to be located in a vacuum.;SOLUTION: In the substrate carrying robot 1 which has a linear motion arm 3 for linearly moving via the linear slider and carries the substrate 9 to a required position, a dust collecting cover 44 made of polyvinyl chloride or fluororesin are arranged in the neighborhood of the linear rails 7, 8 for slidably holding the linear sliders 18, 23 via minute clearance with the linear sliders 18, 23, and along the linear rails 7, 8. A dust collecting cover 10 is arranged in the vicinity of a linear slider 7 to slide on the linear rail 6. Particles 13 scattered when the linear slider 17 slides on the linear rail 6 are collected by means of the labyrinth shape portion of the dust collecting cover 10. As a result, the flowing-out of the particles 13 from the opening portion of an arm cover 8 is prevented, and the sticking of the particles 13 on the wafer 12 on a wafer carrying fork 3 is prevented.;COPYRIGHT: (C)2009,JPO&INPIT