Use of spectrum measurement technology in order watches the supply quantity of the reactivity vapor to the reactivity vapor injection system of the prefix pump and at the same time to control

摘要

Topic SolutionsAs for this invention, the process gas is introduced by the process interior and at the same time is discharged through the exhaust road of the vacuum processed system, it regards the vacuum processed system. It decreases the sediment which is formed by the exhaust, by introducing at the high-level reactivity vapor of the device which receives the influence of the sediment and or cancels. At the high level and downstream of the device which receives influence vapor phase density of the vapor component which is discharged is measured, in addition, the quantity of the reactivity vapor which is introduced by whether or not from these measurable quantities, at the sediment on the device which receives influence the component is consumed deciding, is controlled. Selective figure Figure 2