Rectangular / grid data conversion method of the charged particle beam exposure mask pattern and a charged particle beam exposure method using the same

摘要

PROBLEM TO BE SOLVED: To avoid a generation of poor exposure region even if relative displacement arises when switching one of mutually complementary masks to the other.;SOLUTION: Prior to the conversion to the grid pattern, a large rectangular pattern 30 is divided into four to regions 31-34. Obtain a pattern area density αp for each region 31-34, convert it into a matrix pattern or L/S pattern, and make adjacent divisions mutually complementary sub-patterns. That is, make the pattern of pattern element groups contained in regions 32 and 34 and that of regions 32 and 33 to be mutually complementary patterns. Since the grid pattern of each division is subjected to boundary treatment, pattern elements are connected on both sides of a splitting line, thereby, when mutually complementary masks are switched in the exposure, even if a relative displacement occurs, a poor exposure hardly occurs due to the spreading of the width of space.;COPYRIGHT: (C)2006,JPO&NCIPI