High-speed optical and annealing process to low-temperature plasma deposition of a light-absorbing layer

摘要

A method for process a workpiece, the method includes the steps of introducing into the chamber containing the workpiece the light-absorbing material precursor gas by applying an RF source current is above the workpiece The at least partially absorbed by the light absorbing material layer, a step of generating an RF oscillation toroidal plasma current reentrant path that includes a process zone, depositing a layer of light-absorbing material on the workpiece, the workpiece I and a step that is exposed to light radiation that is. [Selection Figure 9