首页> 外国专利> Pattern drawing apparatus, pattern drawing method, information recording medium manufacturing master manufacturing method, and information recording medium manufacturing method

Pattern drawing apparatus, pattern drawing method, information recording medium manufacturing master manufacturing method, and information recording medium manufacturing method

机译:图案描绘装置,图案描绘方法,信息记录介质制造母盘制造方法以及信息记录介质制造方法

摘要

A pattern drawing apparatus which is capable of reducing manufacturing costs of information recording media. A partial drawing process is executed in response to output of a reference signal, for drawing, after being on standby for a predetermined standby time period, pattern segments, which are obtained by dividing patterns forming a servo pattern in the direction of the width of the patterns, by irradiation of a resin layer with an electron beam. A drawing position-changing process is executed for changing the irradiation position of the electron beam on the resin, toward a center of rotation of a substrate or away from the center of rotation, within a range of the effective drawing width of the electron beam. These processes are executed a plurality of times to draw an exposure pattern on the resin layer.
机译:一种能够降低信息记录介质的制造成本的图案绘制设备。响应于参考信号的输出而执行部分绘制处理,以在预定的待机时间段内待机之后绘制图案段,这些图案段是通过在形成的图案的宽度方向上划分形成伺服图案的图案而获得的。通过用电子束照射树脂层来形成图案。执行绘制位置改变处理,以在电子束的有效绘制宽度的范围内朝向基板的旋转中心或远离旋转中心改变树脂上的电子束的照射位置。多次执行这些处理以在树脂层上绘制曝光图案。

著录项

  • 公开/公告号JP4286672B2

    专利类型

  • 公开/公告日2009-07-01

    原文格式PDF

  • 申请/专利权人 TDK株式会社;

    申请/专利号JP20040004911

  • 发明设计人 添野 佳一;

    申请日2004-01-13

  • 分类号G11B5/84;G03F7/20;

  • 国家 JP

  • 入库时间 2022-08-21 19:39:11

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号