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Pattern drawing apparatus, method pattern drawing, information method of manufacturing recording medium manufacturing master, and a manufacturing method of the information recording medium

机译:图案绘制装置,方法图案绘制,制造记录介质的制造母版的信息方法以及信息记录介质的制造方法

摘要

PROBLEM TO BE SOLVED: To reduce the cost of manufacturing an information recording medium by carrying out partial drawing processing, and drawing position changing processing in which a drawing position is changed alternately a plurality of times, and drawing an exposure pattern onto a resin layer.;SOLUTION: A pattern drawing device is composed so that an exposure pattern P can be drawn for forming a concave-convex pattern for manufacturing an information recording medium. A beam output is composed so that an electronic beam EB can be outputted of which effective drawing width is smaller than the width and the length of each pattern PSO. A control unit performs processing of drawing the pattern PSO by controlling the beam output to make it output the electronic beam EB, and controlling a beam deflector to make the electronic beam EB reciprocate in the widthwise direction of the pattern PSO to be drawn after waiting for a predetermined time t1w, when a standard signal S1 generated by a standard signal generator, based on either an internal signal generated inside a rotational mechanism that rotates the substrate or a rotation driving signal to the rotational mechanism so as to synchronize with the rotation of a substrate is outputted, and draws the exposure pattern P.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:通过进行局部绘制处理和绘制位置改变处理来降低信息记录介质的制造成本,在绘制位置改变处理中,绘制位置被交替地改变多次,并且在树脂层上绘制曝光图案。 ;解决方案:构成图案绘制装置,使得可以绘制曝光图案P以形成用于制造信息记录介质的凹凸图案。构成束输出,使得可以输出有效绘图宽度小于每个图案PSO的宽度和长度的电子束EB。控制单元执行以下处理:通过控制光束输出以使其输出电子束EB,并控制光束偏转器以使电子束EB在待等待的图案PSO的宽度方向上往复运动来绘制图案PSO。当由标准信号发生器产生的标准信号S1基于在使基板旋转的旋转机构内部产生的内部信号或与旋转机构同步地向旋转机构施加的旋转驱动信号时,在预定时间t1w时输出基板,并绘制曝光图案P 。;版权所有:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP4353948B2

    专利类型

  • 公开/公告日2009-10-28

    原文格式PDF

  • 申请/专利权人 TDK株式会社;

    申请/专利号JP20060033139

  • 发明设计人 添野 佳一;

    申请日2006-02-10

  • 分类号G03F7/20;G11B7/26;G11B5/84;G11B5/86;

  • 国家 JP

  • 入库时间 2022-08-21 19:40:50

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