首页> 外国专利> PATTERN DRAWING APPARATUS, PATTERN DRAWING METHOD, METHOD FOR MAKING MASTER FOR MANUFACTURING INFORMATION RECORDING MEDIUM, AND METHOD FOR MAKING INFORMATION RECORDING MEDIUM

PATTERN DRAWING APPARATUS, PATTERN DRAWING METHOD, METHOD FOR MAKING MASTER FOR MANUFACTURING INFORMATION RECORDING MEDIUM, AND METHOD FOR MAKING INFORMATION RECORDING MEDIUM

机译:图案绘制装置,图案绘制方法,制造用于制造信息记录介质的主体的方法以及用于制造信息记录介质的方法

摘要

PROBLEM TO BE SOLVED: To reduce the cost of manufacturing an information recording medium by alternately executing multiple times a partial drawing process and a drawing position changing process that changes drawing positions of the partial drawing process to draw an exposure pattern on a resin layer.;SOLUTION: A pattern drawing apparatus is configured so as to draw the exposure pattern P for forming a concave and convex pattern for manufacturing the information recording medium. A beam-outputting unit is configured so as to output an electronic beam EB whose effective drawing width is narrower than the width and length of each pattern PSO1, PSO2, etc. A controller waits for a predetermined time period t1w, t2w, etc., after a reference signal S1 is output by a reference signal generator. Subsequently, the controller draws the exposure pattern P by causing the beam-outputting unit to output the electronic beam EB to alternately execute, multiple times, the partial drawing process that draws parts (drawing regions PSO11, PSO12, etc.) in the width direction in the patterns PSO1, PSO2, etc., and the drawing position changing process that changes the drawing position of the partial drawing process toward the center of rotation to an extent of the effective drawing width, while displacing each drawing position along the direction of rotation according to a skew angle O by changing the waiting time every time the partial drawing process is performed.;COPYRIGHT: (C)2010,JPO&INPIT
机译:解决的问题:通过交替执行多次局部绘制过程和改变局部绘制过程的绘制位置以在树脂层上绘制曝光图案的绘制位置改变过程,来减少制造信息记录介质的成本。解决方案:图案绘制设备被配置为绘制曝光图案P,以形成用于制造信息记录介质的凹凸图案。光束输出单元被配置为输出其有效绘制宽度比每个图案PSO1,PSO2等的宽度和长度窄的电子束EB。控制器等待预定时间段t1w,t2w等,在参考信号发生器输出参考信号S1之后。随后,控制器通过使光束输出单元输出电子束EB来绘制曝光图案P,以交替执行多次在宽度方向上绘制部分(绘制区域PSO11,PSO12等)的局部绘制过程。在图案PSO1,PSO2等中,以及绘制位置改变处理,该绘制位置改变处理将部分绘制过程的绘制位置朝旋转中心改变到有效绘制宽度的程度,同时沿旋转方向移动每个绘制位置每次执行局部拉伸过程时,通过改变等待时间来根据偏斜角O进行调整。;版权所有:(C)2010,日本特许厅

著录项

  • 公开/公告号JP2009245581A

    专利类型

  • 公开/公告日2009-10-22

    原文格式PDF

  • 申请/专利权人 TDK CORP;

    申请/专利号JP20090135646

  • 发明设计人 SOENO KEIICHI;

    申请日2009-06-05

  • 分类号G11B5/84;G03F7/20;

  • 国家 JP

  • 入库时间 2022-08-21 19:45:48

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