Method for manufacturing single cell thin film single crystal silicon solar cell, method for manufacturing back contact thin film single crystal silicon solar cell, and method for manufacturing integrated thin film single crystal silicon solar cell

摘要

The present invention provides a method of manufacturing a semiconductor device, particularly a solar cell, which is capable of forming a desired electrode pattern by a simple process at low cost. In the method, p-type semiconductor layers are formed on a silicon substrate, and a n-type semiconductor layer is formed on the p-type semiconductor layers, and partially removed in a predetermined pattern by laser abrasion to expose the p-type semiconductor layers, thereby forming an electrode pattern.