Supplying the removal manner and exhaust air manner and the vacuum process device null inert gas of the active gas in the inert gas

摘要

PROBLEM TO BE SOLVED: To suppress the equipment costs and the operation costs low and to efficiently remove active gas by using a sputter ion pump as one of major pumps for lowering back-ground pressure of a vacuum chamber, and making the pump to function as a filter for removing active gas in inert gas during a process. ;SOLUTION: A sputter ion pump 5 is operated as a filter for removing an active gas from the environment in a vacuum chamber 1 containing the inert gas fed in the vacuum chamber 1. Pressure caused by the sputter ion pump 5 is low when an inert gas environment process is not worked in the vacuum chamber 1, then it is operated at a high voltage of about 4-10 KV, and a low electric current mode. Also, when an inert gas environment process is operated, the operation is controlled with a power control device 6 so as to be operated at a low voltage less than 1.5 KV and a large current mode. Thus, the sputter ion pump 5 can always remove the active gas.;COPYRIGHT: (C)2000,JPO