Formation manner of the resist pattern which is superior in heat resistance and positive die resist constituent null alkaline

摘要

PROBLEM TO BE SOLVED: To improve the heat resistance of a positive resist pattern formed out of a positive resist compsn. containing an alkali-soluble novolac resin and a quinone diazide-based radiation-sensitive component. SOLUTION: A resist pattern having excellent heat resistance is formed by applying the positive resist compsn. on a substrate to form a resist film, exposing for pattering, developing with an alkali developer and hardening. The positive resist compsn. used contains an alkali-soluble novolac resin, a quinone diazide-based radiation-sensitive agent and an activating agent having no sensitivity to the wavelength of the exposure light for patterning but producing an acid or radical in the succeeding process. In the hardening process, an acid or radical is produced from the activating agent. It is more advantageous if the resist compsn. used contains a crosslinking agent. The positive resist compsn. containing the novolac resin, radiation-sensitive agent, activating agent and crosslinking agent above described is also provided.