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The negative die resist constituent and pattern formation manner null consists of with the based polymer and the silicon content building a bridge medicine which include the epoxy ring of the semiconductor device which utilizes this
The negative die resist constituent and pattern formation manner null consists of with the based polymer and the silicon content building a bridge medicine which include the epoxy ring of the semiconductor device which utilizes this
A negative resist composition and a patterning method for semiconductor devices using the composition are provided. In one aspect, a negative resist composition comprises an alkali-soluble base polymer having an epoxy ring substituent, a silicon-containing crosslinker having multiple hydroxy groups, and a photoacid generator. In another aspect, a patterning method includes using the negative resist composition in a bi-layer resist process to form fine patterns.
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