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Electret condenser microphone method, method for manufacturing a condenser microphone using the same apparatus and electret

机译:驻极体电容麦克风方法,使用该装置的电容麦克风的制造方法和驻极体

摘要

To electret without difficulty, a dielectric film of a condenser microphone formed by micromachining a silicon substrate is also possible and, countermeasures against the change of the microphone sensitivity caused by the variation in characteristics of components and manufacturing variations to provide is possible, the electret technology novel silicon microphone. Complete the silicon microphone chip is mounted on a mounting board which, in this state, by the corona discharge by the needle electrode 51 of one electret processing separately for the dielectric film on the silicon microphone chip one to implement. By adaptively determined based on the measured result of the electret microphone sensitivity of multiple, electret Ka-ryou the second and subsequent, accurate, and efficiently perform the electret dielectric layer.
机译:为了使驻极体没有困难,通过微加工硅基板而形成的电容式传声器的电介质膜也是可能的,并且针对由部件特性的变化和所提供的制造偏差引起的传声器灵敏度的变化的对策是可能的,驻极体技术新颖的硅麦克风。完整地将硅麦克风芯片安装在安装板上,在该状态下,通过一个驻极体的针状电极51的电晕放电,分别实现硅麦克风芯片上的电介质膜。通过根据测得的驻极体传声器灵敏度的多个结果自适应确定,驻极体Ka-ryou可进行第二次及后续,准确,高效地执行的驻极体介电层。

著录项

  • 公开/公告号JPWO2006132193A1

    专利类型

  • 公开/公告日2009-01-08

    原文格式PDF

  • 申请/专利权人 松下電器産業株式会社;

    申请/专利号JP20060551138

  • 发明设计人 巻幡 勝浩;竹内 祐介;小倉 洋;

    申请日2006-06-05

  • 分类号H04R19/01;H04R31/00;H04R19/04;

  • 国家 JP

  • 入库时间 2022-08-21 19:37:02

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