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PENDEO EPITAXIAL STRUCTURES AND DEVICES

机译:奔腾表外结构和装置

摘要

A substrate comprising a trench lateral epitaxial overgrowth structure including a trench cavity, wherein the trench cavity includes a growth-blocking layer or patterned material supportive of a coalescent Pendeo layer thereon, on at least a portion of an inside surface of the trench. Such substrate is suitable for carrying out lateral epitaxial overgrowth to form a bridged lateral overgrowth formation overlying the trench cavity. The bridged lateral overgrowth formation provides a substrate surface on which epitaxial layers can be grown in the fabrication of microelectronic devices such as laser diodes, high electron mobility transistors, ultraviolet light emitting diodes, and other devices in which low dislocation density is critical. The epitaxial substrate structures of the invention can be formed without the necessity for deep trenches, such as are required in conventional Pendeo epitaxial overgrowth structures.
机译:包括沟槽横向外延过度生长结构的衬底,该沟槽横向外延过度生长结构包括沟槽腔,其中该沟槽腔在沟槽的内表面的至少一部分上包括生长阻挡层或在其上支撑聚结Pendeo层的图案化材料。这种衬底适合于进行横向外延过度生长以形成覆盖沟槽腔的桥接的横向过度生长结构。桥接的横向过度生长形成提供了在微电子器件的制造中可以在其上生长外延层的衬底表面,所述微电子器件诸如激光二极管,高电子迁移率晶体管,紫外发光二极管以及其他其中低位错密度至关重要的器件。可以形成本发明的外延衬底结构而无需深沟槽,如常规的Pendeo外延过度生长结构所要求的那样。

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