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Reticle Protection Member, Reticle Carrying Device, Exposure Device and Method for Carrying Reticle
Reticle Protection Member, Reticle Carrying Device, Exposure Device and Method for Carrying Reticle
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机译:光罩保护构件,光罩承载装置,曝光装置和光罩承载方法
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摘要
A position measurement device 29 measures the position of a position measurement mark 26 formed on the lower surface of a reticle 1, thereby measuring the position of the reticle 1. A position measurement device 30 measures the position of the position measurement mark 27 formed on the lower surface of a lower lid 2b, thereby measuring the position of the lower lid 2b. The relative displacement of the reticle 1 and lower lid 2b is known when the position of the reticle 1 and the position of the lower lid 2b are known. Therefore, when the lower lid 2b having the reticle 1 loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid 2b is determined by taking this displacement into account. As a result, the reticle 1 can be correctly set in the exposure device.
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机译:位置测量装置 29 B>测量形成在分划板 1 B>的下表面上的位置测量标记 26 B>的位置,从而测量透镜的位置。标线 1 B>。位置测量装置 30 B>测量在下盖 2 B> b <上形成的位置测量标记 27 B>的位置/ I>,从而测量下盖 2 B> b I>的位置。当标线 1 B>和标线 1 B>的位置和下盖 2 B> b I>的相对位移已知时下盖 2 B> b I>的位置是已知的。因此,当将装载有标线片 1 B>的下盖 2 B> b I>用搬运装置搬运并放置在曝光装置中时,停止下盖 2 B> b I>的位置是通过考虑此位移来确定的。结果,可以在曝光装置中正确设置标线片 1 B>。
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