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Electron Beam Irradiation Method, Electron Beam Irradiation Apparatus, and Electron Beam Irradiation Apparatus for Open-Mouthed Container

机译：开口容器的电子束照射方法，电子束照射装置以及电子束照射装置

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摘要

There are provided an electron beam application method and an electron beam application device capable of uniformly applying electron beams to an object even if the electron beams have a low energy. For this, electron beams (EB) are applied to a beverage container (30) (object) within a magnetic barrier (MF) formed by combining a plurality of magnetic fields generated in an electron beam application region.

机译：提供了一种电子束施加方法和电子束施加装置，即使电子束具有低能量，其也能够均匀地将电子束施加到物体。为此，将电子束（EB）施加到通过结合在电子束施加区域中产生的多个磁场而形成的磁障（MF）内的饮料容器（ 30 ）（物体）。 展开▼

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公开/公告号US2009134338A1

专利类型

公开/公告日2009-05-28

原文格式PDF

申请/专利权人 SHIRO EGUCHI;ISAO HASHIMOTO;SHIGEKATSU SATO;HIDENOBU KOIDE;NOBUYUKI HASHIMOTO;TAKAYUKI SUZUKI;SATORU GOZAKI;TOMOYUKI HIKOSAKA;YUKIO OKAMOTO;HIROYUKI FUJITA;
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申请/专利号US20060065681

发明设计人 SHIGEKATSU SATO;NOBUYUKI HASHIMOTO;TOMOYUKI HIKOSAKA;HIROYUKI FUJITA;YUKIO OKAMOTO;SHIRO EGUCHI;TAKAYUKI SUZUKI;ISAO HASHIMOTO;HIDENOBU KOIDE;SATORU GOZAKI;
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申请日2006-09-21

分类号H01J3/14;A61N5/00;

国家 US

入库时间 2022-08-21 19:33:29

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