首页> 外国专利> Method for the integration of two bipolar transistors in a semiconductor body, semiconductor arrangement in a semiconductor body, and cascode circuit

Method for the integration of two bipolar transistors in a semiconductor body, semiconductor arrangement in a semiconductor body, and cascode circuit

机译:在半导体主体中集成两个双极晶体管的方法,在半导体主体中的半导体装置以及共源共栅电路

摘要

A method for the integration of two bipolar transistors in a semiconductor body, wherein, for the first bipolar transistor, a first emitter semiconductor region, a first base semiconductor region, and a first collector semiconductor region are produced. A recombination layer is applied to the first bipolar transistor, which is adjacent to the first emitter semiconductor region or the first collector semiconductor region and is constructed in such a way that charge carriers recombine on the recombination layer, and next, the second bipolar transistor is placed on the recombination layer, wherein a second emitter semiconductor region, a second base semiconductor region, and a second collector semiconductor region are produced on the recombination layer, so that the second emitter semiconductor region or the second collector semiconductor region is adjacent to the recombination layer.
机译:一种将两个双极型晶体管集成在半导体本体中的方法,其中,对于第一双极型晶体管,制造第一发射极半导体区域,第一基极半导体区域和第一集电极半导体区域。将复合层施加到第一双极晶体管,该第一双极晶体管与第一发射极半导体区域或第一集电极半导体区域相邻,并且以使得电荷载流子在复合层上复合的方式构造,然后,第二双极晶体管为放置在重组层上,其中在重组层上产生第二发射极半导体区域,第二基极半导体区域和第二集电极半导体区域,使得第二发射极半导体区域或第二集电极半导体区域与重组相邻层。

著录项

  • 公开/公告号US7605047B2

    专利类型

  • 公开/公告日2009-10-20

    原文格式PDF

  • 申请/专利权人 CHRISTOPH BROMBERGER;

    申请/专利号US20060366481

  • 发明设计人 CHRISTOPH BROMBERGER;

    申请日2006-03-03

  • 分类号H01L21/331;

  • 国家 US

  • 入库时间 2022-08-21 19:32:16

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号