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Thin film capacitor element composition, high permittivity insulation film, thin film capacitor element, thin film multilayer capacitor, and method of production of thin film capacitor element

机译:薄膜电容器元件组合物,高介电常数绝缘膜,薄膜电容器元件,薄膜多层电容器以及薄膜电容器元件的制造方法

摘要

A thin film capacitor element composition having a bismuth layered compound with a c-axis oriented substantially vertical to the substrate surface, wherein the bismuth layered compound is expressed by the formula (Bi2O2)2+(Am−1BmO3m+1)2− or Bi2Am−1BmO3M+3, the symbol m in the formula is an odd number, at least part of the Bi and/or A of the bismuth layered compound is substituted by a rare earth element, and the number of moles substituted by the rare earth element is larger than 1.0 and 2.8 or less with respect to the number of moles (m+1) of the total of Bi and A.
机译:一种具有铋层状化合物的薄膜电容器元件组合物,所述铋层状化合物的c轴基本垂直于基板表面,其中所述铋层状化合物由式(Bi 2 O 2 < / Sub>) 2 + (A m-1 B m O 3m + 1 2 − 或Bi 2 A m-1 B m O 3M + 3 ,符号m式中的R为奇数,铋层状化合物的Bi和/或A的至少一部分被稀土元素取代,被稀土元素取代的摩尔数大于1.0且小于或等于2.8。关于Bi和A的总摩尔数(m + 1)。

著录项

  • 公开/公告号US7580241B2

    专利类型

  • 公开/公告日2009-08-25

    原文格式PDF

  • 申请/专利权人 YUKIO SAKASHITA;

    申请/专利号US20050578778

  • 发明设计人 YUKIO SAKASHITA;

    申请日2005-04-26

  • 分类号H01G4/06;

  • 国家 US

  • 入库时间 2022-08-21 19:32:04

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