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Photomask assembly and method for protecting the same from contaminants generated during a lithography process
Photomask assembly and method for protecting the same from contaminants generated during a lithography process
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机译:光掩模组件及其用于保护其免受光刻过程中产生的污染物影响的方法
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摘要
A photomask assembly and method for protecting the photomask assembly from contaminants generated during a lithography process are disclosed. A photomask assembly includes a pellicle assembly formed from a pellicle frame and a pellicle film coupled to a first surface of the pellicle frame. The pellicle frame further includes an inner wall and an outer wall. A photomask is coupled to a second surface of the pellicle frame opposite the pellicle film. A molecular sieve that prevents airborne molecular contaminants (AMCs) generated during a lithography process from contaminating the photomask is associated with the pellicle assembly.
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