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Process Evaluation of Directed Self-assembly Lithography using Simulation Method based on Self-consistent Field Theory

机译：基于自洽场理论的仿真方法对定向自组装光刻的过程评估

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Katsuyoshi Kodera; Hideki Kanai; Hironobu Sato; Naoko Kihara; Yusuke Kasahara; Katsutoshi Kobayashi; Ken Miyagi; Shinya Minegishi; Toshikatsu Tobana; Tomoharu Fujiwara; Noriyuki Hirayanagi; Yoshiaki Kawamonzen; Tsukasa Azuma;
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1. Process Evaluation of Directed Self-assembly Lithography using Simulation Method based on Self-consistent Field Theory [J] . Katsuyoshi Kodera, Hideki Kanai, Hironobu Sato, Journal of Photopolymer Science and Technology . 2014,第1期

机译：基于自洽场论的仿真方法对定向自组装光刻工艺的评价
2. ProcessEevaluation of Directed Self-assembly Lithography using Simulation Method based on Self-consistent Field Theory [J] . Katsuyoshi Kodera, Hideki Kanai, Hironobu Sato Journal of Photopolymer Science and Technology . 2014,第1期

机译：基于自洽场论的仿真方法对定向自组装光刻工艺的评价
3. Enhancing the potential of block copolymer lithography with polymer self-consistent field theory simulations [J] . Mickiewicz R.A., Yang J.K.W., Hannon A.F., Macromolecules . 2010,第19期

机译：利用聚合物自洽场论模拟增强嵌段共聚物光刻的潜力
4. Defect-aware process margin for chemo-epitaxial directed self-assembly lithography using simulation method based on self-consistent field theory [C] . Katsuyoshi Kodera, Hironobu Sato, Hideki Kanai, Alternative lithographic technologies VI . 2014

机译：基于自洽场理论的化学外延定向自组装光刻的缺陷识别工艺裕度
5. Self-assembly of Block Polymers: Self-consistent Field Theory and Monte-Carlo Simulations [D] . Arora, Akash. 2018

机译：块聚合物的自组装：自洽场理论和蒙特卡罗模拟
6. Complex microstructures of ABC triblock copolymer thin films directed by polymer brushes based on self-consistent field theory [O] . Zhibin Jiang, Chang Xu, Yu dong Qiu, 2014

机译：基于自洽场理论的聚合物刷引导的ABC三嵌段共聚物薄膜的复杂微观结构
7. Enhancing the potential of block copolymer lithography with polymer self-consistent field theory simulations [O] . Mickiewicz R.A., Yang J.K.W., Hannon A.F., 2010

机译：利用聚合物自洽场理论模拟增强嵌段共聚物光刻的潜力
8. External Fields in the Self-Consistent Theory of Electronic States: A New Method for Direct Evaluation of Macroscopic and Microscopic Dielectric Response [R] . Kunc, K., Resta, R. 1983

机译：电子态自洽理论中的外部场域：直接评估宏观和微观介电响应的新方法

Process Evaluation of Directed Self-assembly Lithography using Simulation Method based on Self-consistent Field Theory

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