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Nanometer-level mix-and-match scanning tip and electron beam lithography using global backside position reference marks
Nanometer-level mix-and-match scanning tip and electron beam lithography using global backside position reference marks
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机译:使用全局背面位置参考标记的纳米级混合匹配扫描头和电子束光刻
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摘要
An interferometric-spatial-phase imaging (ISPI) system includes a substrate wafer. An alignment configuration is permanently embedded in the substrate wafer. The alignment configuration uses a global coordinate reference system by providing a plurality of global reference marks that encompass up to the entire substrate wafer. A plurality of alignment markings is provided on a surface in close proximity to the alignment configuration for obtaining continuous six-axis control to provide positional information of a scanning probe tip or an electron beam with respect to said global coordinate reference system.
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