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Test structure and method for detecting and studying crystal lattice dislocation defects in integrated circuit devices

机译:用于检测和研究集成电路器件中晶格位错缺陷的测试结构和方法

摘要

A test structure (200, 200′) having an array (224) of test devices (220) for detecting and studying defects that can occur in an integrated circuit device, e.g., a transistor (144), due to the relative positioning of one component (100) of the device with respect to another component (108) of the device. The test devices in the array are of a like kind, but vary in their configuration. The differences in the configurations are predetermined and selected with the intent of forcing defects to occur within at least some of the test devices. During testing, the responses of the test devices are sensed so as to determine whether or not a defect has occurred in any one or more of the test devices. If a defective test device is detected, the corresponding wafer (204) may be subjected to physical failure analysis for yield learning.
机译:具有测试设备( 220 )的阵列( 224 )的测试结构( 200、200 '),用于检测和研究可能发生的缺陷在集成电路设备(例如晶体管( 144 ))中,由于该设备的一个组件( 100 )相对于另一组件( 108 )。阵列中的测试设备属于同类设备,但配置不同。为了迫使缺陷在至少一些测试装置内发生而预先确定和选择配置中的差异。在测试期间,感测测试设备的响应,以便确定在任何一个或多个测试设备中是否已经发生缺陷。如果检测到有缺陷的测试设备,则可以对相应的晶圆( 204 )进行物理故障分析以进行良率学习。

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