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Exposure method that obtains, prior to exposure, reticle surface form data and measurement position error, for scanning control
Exposure method that obtains, prior to exposure, reticle surface form data and measurement position error, for scanning control
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机译:曝光前获取掩模版表面形状数据和测量位置误差以进行扫描控制的曝光方法
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摘要
An exposure method for exposing a pattern of a reticle onto a plate, via a projection optical system, while synchronously scanning the reticle and the plate. The exposure method includes the steps of (a) measuring before exposing, the measuring step including (i) a first substep of obtaining surface form data that shows a surface form of the reticle, and (ii) a second substep of detecting a measurement position having an abnormal measurement result as an error measurement position among measurement positions, to measure the surface form of the reticle based on a measurement result of the obtaining substep, and (b) controlling synchronous scanning of the reticle and the plate using the measurement result of the detecting substep, except for the detecting result of the error measurement position.
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