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Position measurement method for measuring a position of an exposure mask and exposure method for transferring an image of the pattern formed in an exposure mask
Position measurement method for measuring a position of an exposure mask and exposure method for transferring an image of the pattern formed in an exposure mask
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机译:用于测量曝光掩模的位置的位置测量方法和用于转印形成在曝光掩模中的图案的图像的曝光方法
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摘要
Positions of a plurality of marks formed in a correction mask are measured as first positions. A plurality of marks in the correction mask are transferred onto a photosensitive substrate, and transferred positions of the plurality of marks are determined as second positions. Subsequently, amounts of deviation of the first positions from the second positions are determined as correction data. After that, positions of a plurality of marks formed in an exposure mask are measured as third positions by a method similar to that used for measurement of the first positions, and the third positions are corrected on the basis of the correction data.
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