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Performance of bias-correction methods for exposure measurement error using repeated measurements with and without missing data

机译:使用重复测量(有无数据丢失)的曝光测量误差的偏差校正方法的性能

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It is known that measurement error leads to bias in assessing exposure effects, which can however, be corrected if independent replicates are available. For expensive replicates, two-stage (2S) studies that produce data 'missing by design', may be preferred over a single-stage (1S) study, because in the second stage, measurement of replicates is restricted to a sample of first-stage subjects. Motivated by an occupational study on the acute effect of carbon black exposure on respiratory morbidity, we compare the performance of several bias-correction methods for both designs in a simulation study: an instrumental variable method (EVROS IV) based on grouping strategies, which had been recommended especially when measurement error is large, the regression calibration and the simulation extrapolation methods. For the 2S design, either the problem of 'missing' data was ignored or the 'missing' data were imputed using multiple imputations. Both in 1S and 2S designs, in the case of small or moderate measurement error, regression calibration was shown to be the preferred approach in terms of root mean square error. For 2S designs, regression calibration as implemented by Stata software is not recommended in contrast to our implementation of this method; the 'problematic' implementation of regression calibration although substantially improved with use of multiple imputations. The EVROS IV method, under a good/fairly good grouping, outperforms the regression calibration approach in both design scenarios when exposure mismeasurement is severe. Both in 1S and 2S designs with moderate or large measurement error, simulation extrapolation severely failed to correct for bias.
机译:众所周知,测量误差会导致评估曝光效果时出现偏差,但是,如果有独立的复制品,则可以纠正。对于昂贵的复制品,可能会产生“设计导致的数据丢失”的两阶段(2S)研究,而不是单阶段(1S)研究,因为在第二阶段,复制品的测量仅限于第一阶段的样本。舞台主题。根据一项关于炭黑暴露对呼吸道疾病的急性影响的职业研究的动机,我们在模拟研究中比较了两种设计的几种偏差校正方法的性能:一种基于分组策略的仪器可变方法(EVROS IV),建议特别在测量误差较大时使用回归校准和模拟外推方法。对于2S设计,要么忽略“丢失”数据的问题,要么使用多个插补插补“丢失”数据的问题。在1S和2S设计中,在测量误差较小或中等的情况下,就均方根误差而言,回归校准被证明是首选方法。对于2S设计,与我们实施此方法相反,不建议使用Stata软件实施的回归校准。回归校准的“有问题的”实施,尽管使用多个插补已大大改善。 EVROS IV方法在良好/非常良好的分组下,在两种测量方案中,当曝光错误测量严重时,其性能均优于回归校准方法。在具有中等或较大测量误差的1S和2S设计中,仿真外推都严重无法校正偏差。

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